Peculiarities of latent track etching in SiO2/Si structures irradiated with Ar, Kr and Xe ions

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THE EXTENDED LAW OF CORRESPONDING - STATES AND THE INTERMOLECULAR POTENTIALS FOR Ar-Ar, Ar-Kr AND Kr-Kr

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the extended law of corresponding - states and the intermolecular potentials for ar-ar, ar-kr and kr-kr

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ژورنال

عنوان ژورنال: Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms

سال: 2016

ISSN: 0168-583X

DOI: 10.1016/j.nimb.2015.08.046